A Focused Ion Beam (FIB) is a sophisticated tool used primarily for imaging, milling, and modification of materials at the microscopic level. It works by directing a fine beam of charged ions (usually gallium) onto a sample. The ions interact with the surface of the material, causing physical changes like material removal or modification. This is useful for tasks like sample preparation, circuit editing, and even nano-manufacturing.
Key applications of FIB include:
- Microscopy: FIB can be used in conjunction with Scanning Electron Microscopes (SEM) to provide high-resolution imaging at the nanoscale.
- Material Milling: The ion beam can mill away thin layers of a material, which is often used for preparing cross-sections or creating specific features on a sample.
- Sample Modification: FIB can also deposit material onto a surface (known as ion beam deposition), allowing for localized modifications at a nanometer scale.
- Failure Analysis: Engineers use FIB to cut into devices, such as integrated circuits, to inspect internal structures without damaging the entire component.
FIB is a highly precise tool, capable of working at resolutions as small as a few nanometers, which makes it an indispensable technology in fields like semiconductor manufacturing, materials science, and nanotechnology.
